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Semiconductors

2026-03-12 169

The manufacture of semiconductor products requires the use of high-purity materials, strictly controlled processes, and analytical and control systems with high sensitivity and resolution to accommodate chemical changes, as well as high stability and repeatability in analytical techniques. The ProC-TOF utilises low-pressure photoionisation (LPPI) technology and excels in the following specific applications:

1. Gas purity monitoring

The ProC series of gas analysis systems, with detection limits in the ppb range, is the product of choice for gas purity applications. It utilises the company’s new technology: the low-pressure photoionisation (LPPI) source, a soft ionisation source that makes spectra simple and straightforward to interpret.

2. Photolithography

The ProC-TOF series of mass spectrometers (available with bespoke configurations) offers high sensitivity and resolution, enabling the analysis and characterisation of outgassing from materials and gases generated during photoresist decomposition.

3. MBE Monitoring

Analysis of Molecular Beam Epitaxy (MBE) requires mass spectrometers equipped with extremely high-sensitivity, low-noise electronic components to monitor the low flux rates of multiple molecular beams and to perform ultra-high vacuum (UHV) residual gas analysis of the molecular beams.

4. Plasma and CVD Process Monitoring

Plasma etching, Chemical Vapour Deposition (CVD) and Plasma-Enhanced Chemical Vapour Deposition (PECVD) applications require a thorough understanding of the complex chemicals involved in the process. For plasma applications, scientists choose ProC-specialised mass spectrometers. These detection systems are capable of performing energy analysis, offering high performance and speed. Monitoring of very low partial pressure components in high-background environments. Ions, radicals and neutral ions can also be measured. Processes up to atmospheric pressure can be handled.

5. Scrubber/Incinerator Efficiency

Monitoring of destruction and removal efficiency (DRE) for hazardous air pollutants (HAPs) and greenhouse gases. ProC-TOF mass spectrometer systems are used to help reduce emissions, ensure compliance with regulatory requirements and improve the efficiency of emission reduction systems. They minimise the use of scrubbers and combustion chambers for combustible gases. Detected substances include HAPs, halogenated volatile organic compounds (HVOCs), greenhouse gases, lead and germanium,

6. Semiconductor industry: Automated monitoring of airborne molecular contaminants (AMC)

The ProC-TOF can be specifically customised for standardised FOUPs, wafer fabs and cleanroom environmental monitoring, utilising mass spectrometry to monitor trends in pollutant concentration changes in real time during the FOUP cleaning process. During the transport and temporary storage of wafers in wafer transport containers (FOUPs), the precise measurement of low-concentration pollutants emitted from the inner walls helps to adjust production processes; reduce wafer defects; and optimise the FOUP cleaning process. Based on measurement results from existing FOUPs, it is possible to design and develop next-generation FOUPs, monitor cleanrooms in manufacturing plants, monitor external and incoming air, and carry out automated perimeter line monitoring, amongst other applications.